4-MIRROR IMAGING-SYSTEM (MAGNIFICATION +1-5) FOR ARF EXCIMER-LASER LITHOGRAPHY

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dc.contributor.authorRIM, CSko
dc.contributor.authorCHO, YMko
dc.contributor.authorKong, Hong-Jinko
dc.contributor.authorLEE, SSko
dc.date.accessioned2013-02-28T03:33:42Z-
dc.date.available2013-02-28T03:33:42Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1995-05-
dc.identifier.citationOPTICAL AND QUANTUM ELECTRONICS, v.27, no.5, pp.319 - 325-
dc.identifier.issn0306-8919-
dc.identifier.urihttp://hdl.handle.net/10203/72560-
dc.description.abstractResearch was conducted on the axially symmetric four-mirror system (magnification + 1/5) for use in optical lithography using an ArF excimer laser beam. The initial design is derived from an extensive numerical calculation that makes the sum of the third-order aberration coefficients very small (SIGMA(j=i)V\S(j)\ < 10(-6). Using an optimization method (damped least-squares method) the finite aberrations are reduced; then, to obtain the diffraction-limited performance, three surfaces are aspherized. The final system has NA = 0.38 for the ArF excimer laser line (lambda = 0.193 mum) and depth of focus of 1.2 mum over a 2.6 x 2.6 cm2 object field. Nearly all rays fall within the Airy disk in the image plane. The resolution is 540 cycles mm-1 at MTF = 0.5 level for axial object point. We consider that the present four-mirror system may be further refined for use in soft x-ray lithography.-
dc.languageEnglish-
dc.publisherCHAPMAN HALL LTD-
dc.subjectSUBMICROMETER LITHOGRAPHY-
dc.subjectOPTICAL-SYSTEM-
dc.title4-MIRROR IMAGING-SYSTEM (MAGNIFICATION +1-5) FOR ARF EXCIMER-LASER LITHOGRAPHY-
dc.typeArticle-
dc.identifier.wosidA1995RE99800004-
dc.identifier.scopusid2-s2.0-0029304744-
dc.type.rimsART-
dc.citation.volume27-
dc.citation.issue5-
dc.citation.beginningpage319-
dc.citation.endingpage325-
dc.citation.publicationnameOPTICAL AND QUANTUM ELECTRONICS-
dc.identifier.doi10.1007/BF00563566-
dc.contributor.localauthorKong, Hong-Jin-
dc.contributor.nonIdAuthorRIM, CS-
dc.contributor.nonIdAuthorCHO, YM-
dc.contributor.nonIdAuthorLEE, SS-
dc.type.journalArticleArticle-
dc.subject.keywordPlusSUBMICROMETER LITHOGRAPHY-
dc.subject.keywordPlusOPTICAL-SYSTEM-
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