DC Field | Value | Language |
---|---|---|
dc.contributor.author | RIM, CS | ko |
dc.contributor.author | CHO, YM | ko |
dc.contributor.author | Kong, Hong-Jin | ko |
dc.contributor.author | LEE, SS | ko |
dc.date.accessioned | 2013-02-28T03:33:42Z | - |
dc.date.available | 2013-02-28T03:33:42Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1995-05 | - |
dc.identifier.citation | OPTICAL AND QUANTUM ELECTRONICS, v.27, no.5, pp.319 - 325 | - |
dc.identifier.issn | 0306-8919 | - |
dc.identifier.uri | http://hdl.handle.net/10203/72560 | - |
dc.description.abstract | Research was conducted on the axially symmetric four-mirror system (magnification + 1/5) for use in optical lithography using an ArF excimer laser beam. The initial design is derived from an extensive numerical calculation that makes the sum of the third-order aberration coefficients very small (SIGMA(j=i)V\S(j)\ < 10(-6). Using an optimization method (damped least-squares method) the finite aberrations are reduced; then, to obtain the diffraction-limited performance, three surfaces are aspherized. The final system has NA = 0.38 for the ArF excimer laser line (lambda = 0.193 mum) and depth of focus of 1.2 mum over a 2.6 x 2.6 cm2 object field. Nearly all rays fall within the Airy disk in the image plane. The resolution is 540 cycles mm-1 at MTF = 0.5 level for axial object point. We consider that the present four-mirror system may be further refined for use in soft x-ray lithography. | - |
dc.language | English | - |
dc.publisher | CHAPMAN HALL LTD | - |
dc.subject | SUBMICROMETER LITHOGRAPHY | - |
dc.subject | OPTICAL-SYSTEM | - |
dc.title | 4-MIRROR IMAGING-SYSTEM (MAGNIFICATION +1-5) FOR ARF EXCIMER-LASER LITHOGRAPHY | - |
dc.type | Article | - |
dc.identifier.wosid | A1995RE99800004 | - |
dc.identifier.scopusid | 2-s2.0-0029304744 | - |
dc.type.rims | ART | - |
dc.citation.volume | 27 | - |
dc.citation.issue | 5 | - |
dc.citation.beginningpage | 319 | - |
dc.citation.endingpage | 325 | - |
dc.citation.publicationname | OPTICAL AND QUANTUM ELECTRONICS | - |
dc.identifier.doi | 10.1007/BF00563566 | - |
dc.contributor.localauthor | Kong, Hong-Jin | - |
dc.contributor.nonIdAuthor | RIM, CS | - |
dc.contributor.nonIdAuthor | CHO, YM | - |
dc.contributor.nonIdAuthor | LEE, SS | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | SUBMICROMETER LITHOGRAPHY | - |
dc.subject.keywordPlus | OPTICAL-SYSTEM | - |
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