Application of DV-Xa Cluster Method to the Cr-Al Oxide Mask Materials for Deep UV Lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Jiang, Zhong-Tao | ko |
| dc.contributor.author | Yamaguchi, Tomuo | ko |
| dc.contributor.author | Kim, Eunah | ko |
| dc.contributor.author | Hong, Seung Bum | ko |
| dc.contributor.author | No, Kwangsoo | ko |
| dc.contributor.author | Kang, Young Seog | ko |
| dc.contributor.author | Park, Soon Ja | ko |
| dc.contributor.author | Koh, Young Bum | ko |
| dc.date.accessioned | 2013-02-28T01:12:33Z | - |
| dc.date.available | 2013-02-28T01:12:33Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1997-01 | - |
| dc.identifier.citation | BULLETIN OF THE SOCIETY FOR DISCRETE VARIATIONAL XA, v.10, no.2, pp.22 - 26 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/71942 | - |
| dc.language | English | - |
| dc.publisher | Society for Discrete Variational Xa | - |
| dc.title | Application of DV-Xa Cluster Method to the Cr-Al Oxide Mask Materials for Deep UV Lithography | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 10 | - |
| dc.citation.issue | 2 | - |
| dc.citation.beginningpage | 22 | - |
| dc.citation.endingpage | 26 | - |
| dc.citation.publicationname | BULLETIN OF THE SOCIETY FOR DISCRETE VARIATIONAL XA | - |
| dc.contributor.localauthor | No, Kwangsoo | - |
| dc.contributor.nonIdAuthor | Jiang, Zhong-Tao | - |
| dc.contributor.nonIdAuthor | Yamaguchi, Tomuo | - |
| dc.contributor.nonIdAuthor | Kim, Eunah | - |
| dc.contributor.nonIdAuthor | Hong, Seung Bum | - |
| dc.contributor.nonIdAuthor | Kang, Young Seog | - |
| dc.contributor.nonIdAuthor | Park, Soon Ja | - |
| dc.contributor.nonIdAuthor | Koh, Young Bum | - |
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