Application of DV-Xa Cluster Method to the Cr-Al Oxide Mask Materials for Deep UV Lithography

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dc.contributor.authorJiang, Zhong-Taoko
dc.contributor.authorYamaguchi, Tomuoko
dc.contributor.authorKim, Eunahko
dc.contributor.authorHong, Seung Bumko
dc.contributor.authorNo, Kwangsooko
dc.contributor.authorKang, Young Seogko
dc.contributor.authorPark, Soon Jako
dc.contributor.authorKoh, Young Bumko
dc.date.accessioned2013-02-28T01:12:33Z-
dc.date.available2013-02-28T01:12:33Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1997-01-
dc.identifier.citationBULLETIN OF THE SOCIETY FOR DISCRETE VARIATIONAL XA, v.10, no.2, pp.22 - 26-
dc.identifier.urihttp://hdl.handle.net/10203/71942-
dc.languageEnglish-
dc.publisherSociety for Discrete Variational Xa-
dc.titleApplication of DV-Xa Cluster Method to the Cr-Al Oxide Mask Materials for Deep UV Lithography-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume10-
dc.citation.issue2-
dc.citation.beginningpage22-
dc.citation.endingpage26-
dc.citation.publicationnameBULLETIN OF THE SOCIETY FOR DISCRETE VARIATIONAL XA-
dc.contributor.localauthorNo, Kwangsoo-
dc.contributor.nonIdAuthorJiang, Zhong-Tao-
dc.contributor.nonIdAuthorYamaguchi, Tomuo-
dc.contributor.nonIdAuthorKim, Eunah-
dc.contributor.nonIdAuthorHong, Seung Bum-
dc.contributor.nonIdAuthorKang, Young Seog-
dc.contributor.nonIdAuthorPark, Soon Ja-
dc.contributor.nonIdAuthorKoh, Young Bum-
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