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HfO2/HfOxNy/HfO2 Gate Dielectric Fabricated by In Situ Oxidation of Plasma-Enhanced Atomic Layer Deposition HfN Middle Layer Maeng, W. J.; Gu, Gil Ho; Park, C. G.; Lee, Kayoung; Lee, Taeyoon; Kim, Hyungjun, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.156, no.8, pp.G109 - G113, 2009 |
Synthesis of a Nickel Single-Atom Catalyst Based on Ni-N4-xCx Active Sites for Highly Efficient CO2 Reduction Utilizing a Gas Diffusion Electrode Abbas, Syed Asad; Song, Jun Tae; Tan, Ying Chuan; Nam, Ki Min; Oh, Jihun; Jung, Kwang-Deog, ACS APPLIED ENERGY MATERIALS, v.3, no.9, pp.8739 - 8745, 2020-09 |
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