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EFFECTS OF POST DEPOSITION ANNEALING ON THE ELECTRICAL-PROPERTIES AND RELIABILITY OF ULTRATHIN CHEMICAL-VAPOR-DEPOSITED TA2O5 FILMS HAN, LK; Yoon, Giwan; KWONG, DL; MATHEWS, VK; FAZAN, PC, IEEE ELECTRON DEVICE LETTERS, v.15, no.8, pp.280 - 282, 1994-08 |
Ir and Ru bottom electrodes for (Ba, Sr) TiO3 thin films deposited by liquid delivery source chemical vapor deposition Kim, Ho Gi, THIN SOLID FILMS, v.323, no.1-2, pp.285 - 290, 1998-06 |
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