Browse "College of Engineering(공과대학)" by Author Moon, Seong-Yong
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| Chromium Aluminim Oxide Phase-Shifting Mask Material for 193nm Lithography No, Kwangsoo; Kim, Eun Ah; Hong, Seung Bum; Moon, Seong-Yong, Third International Symposium on 193nm Lithography, pp.127 -, 1997 |
| Molybdenum을 이용한 photomask blank 재료에 관한 연구 = A study on the photomask blank material based on molybdenumlink 문성용; Moon, Seong-Yong; et al, 한국과학기술원, 1999 |
| Simulation study and fabrication of high transmittance attenuated phase shifting mask Kim, Eunah; No, Kwangsoo; Hong, Daniel Seungbum; Moon, Seong-Yong; Kim, Yong-Hoon; Yoon, Hee-Sun, SPIE Proceedings, v.3873, 1999-12 |
| Simulation study and fabrication of high transmittance attenuated phase shifting mask Kim, Eun Ah; Hong, Seung Bum; Moon, Seong-Yong; Kim, Yong-Hoon; Yoon, Hee-Sun; No, Kwangsoo, 19th Annual BACUS Symposium on Photomask Technology, SPIE, 1999-09-15 |
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