Phase formations and electrical properties of doped-PZT/PbTiO3 films deposited by reactive sputtering using multi-targets

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The crystal structure and electrical properties of doped-PST films with buffer layer deposited on Pt/SiO2/Si substrates by reactive sputtering, have been investigated. By using the PbTiO3(PT) buffer layer, highly (100) oriented PZT films are obtained at the deposition temperature of 550 degrees C. The tetragonality of PZT films is decreased with Ta concentration. Surface morphology and grain size of PZT films are also changed with the content of Ta doping. With increasing Ta doping, the surface morphology of Ta doped PZT(PTZT) films was slightly smoothed and the grain sizes were considerably enlarged. PTZT exhibits improved a fatigue properties. The results indicate that the fatigue properly of PZT can be influenced by introducing foreign elements.
Publisher
ELSEVIER SCIENCE SA LAUSANNE
Issue Date
1996-10
Language
English
Article Type
Article; Proceedings Paper
Keywords

THIN-FILMS

Citation

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, v.41, no.1, pp.16 - 22

ISSN
0921-5107
DOI
10.1016/S0921-5107(96)01616-9
URI
http://hdl.handle.net/10203/69944
Appears in Collection
MS-Journal Papers(저널논문)
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