DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, JS | ko |
dc.contributor.author | Choi, Yang-Kyu | ko |
dc.contributor.author | Ha, DW | ko |
dc.contributor.author | Balasubramanian, S | ko |
dc.contributor.author | King, TJ | ko |
dc.contributor.author | Bokor, J | ko |
dc.date.accessioned | 2007-06-27T06:29:28Z | - |
dc.date.available | 2007-06-27T06:29:28Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-03 | - |
dc.identifier.citation | IEEE ELECTRON DEVICE LETTERS, v.24, no.3, pp.186 - 188 | - |
dc.identifier.issn | 0741-3106 | - |
dc.identifier.uri | http://hdl.handle.net/10203/689 | - |
dc.description.abstract | The hydrogen annealing process has been used to improve surface roughness of Si-fin in CMOS FinFETs for the first time. The hydrogen annealing was performed after Si-fin etch and before gate oxidation. As a result, increased saturation current with a lowered threshold voltage and a decreased low-frequency noise level over the entire range of drain current have been attained. The low-frequency noise characteristics indicate that the oxide trap density is reduced by a factor of 3 due to hydrogen annealing. These results suggest that the hydrogen annealing is very effective for improving the device performance and for attaining a high-quality surface of the etched Si-fin. | - |
dc.description.sponsorship | This work was supported by the Air Force Office of Scientific Research under DURIP Grant F49620-01-1-0285 and the Semiconductor Research Corporation under Contract 2000-NJ-850 and MARCO Contract 2001-MT-887. The review of this letter was arranged by Editor B. Yu. | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
dc.subject | SPACER FINFET | - |
dc.subject | TERABIT ERA | - |
dc.subject | SURFACE | - |
dc.subject | TECHNOLOGY | - |
dc.title | Hydrogen annealing effect on DC and low-frequency noise characteristics in CMOS FinFETs | - |
dc.type | Article | - |
dc.identifier.wosid | 000183268000021 | - |
dc.identifier.scopusid | 2-s2.0-0038614785 | - |
dc.type.rims | ART | - |
dc.citation.volume | 24 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | 186 | - |
dc.citation.endingpage | 188 | - |
dc.citation.publicationname | IEEE ELECTRON DEVICE LETTERS | - |
dc.identifier.doi | 10.1109/LED.2003.809526 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Choi, Yang-Kyu | - |
dc.contributor.nonIdAuthor | Lee, JS | - |
dc.contributor.nonIdAuthor | Ha, DW | - |
dc.contributor.nonIdAuthor | Balasubramanian, S | - |
dc.contributor.nonIdAuthor | King, TJ | - |
dc.contributor.nonIdAuthor | Bokor, J | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | double gate | - |
dc.subject.keywordAuthor | FinFET | - |
dc.subject.keywordAuthor | hydrogen anneal | - |
dc.subject.keywordAuthor | low-frequency noise | - |
dc.subject.keywordAuthor | silicon-on-insulator (SOI) | - |
dc.subject.keywordAuthor | ultrathin body | - |
dc.subject.keywordPlus | SPACER FINFET | - |
dc.subject.keywordPlus | TERABIT ERA | - |
dc.subject.keywordPlus | SURFACE | - |
dc.subject.keywordPlus | TECHNOLOGY | - |
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