Optimization of Silicon Quantum Dot Fabrication on Oxide and Nitride Films
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | hyungcheol shin | ko |
| dc.contributor.author | jongho lee | ko |
| dc.date.accessioned | 2013-02-27T14:03:42Z | - |
| dc.date.available | 2013-02-27T14:03:42Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1999-08 | - |
| dc.identifier.citation | 전기학회논문지, v.4, no.4, pp.519 - 522 | - |
| dc.identifier.issn | 1975-8359 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/68979 | - |
| dc.language | English | - |
| dc.publisher | 대한전기학회 | - |
| dc.title | Optimization of Silicon Quantum Dot Fabrication on Oxide and Nitride Films | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 4 | - |
| dc.citation.issue | 4 | - |
| dc.citation.beginningpage | 519 | - |
| dc.citation.endingpage | 522 | - |
| dc.citation.publicationname | 전기학회논문지 | - |
| dc.contributor.localauthor | hyungcheol shin | - |
| dc.contributor.nonIdAuthor | jongho lee | - |
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