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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Journal Papers(저널논문)

고밀도 플라즈마 CVD 방법에 의한 TiN barrier metal 형성과 특성Characteristics of TiN Barrier Metal Prepared by High Density Plasma CVD Method

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dc.contributor.author최치규ko
dc.contributor.author강민성ko
dc.contributor.author오경숙ko
dc.contributor.author이유성ko
dc.contributor.author오대현ko
dc.contributor.author황찬용ko
dc.contributor.author손종원ko
dc.contributor.author이정용ko
dc.contributor.author김건호ko
dc.date.accessioned2013-02-27T12:22:42Z-
dc.date.available2013-02-27T12:22:42Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1999-12-
dc.identifier.citation한국재료학회지, v.9, no.11, pp.1129 - 1136-
dc.identifier.issn1225-0562-
dc.identifier.urihttp://hdl.handle.net/10203/68561-
dc.languageKorean-
dc.publisher한국재료학회-
dc.title고밀도 플라즈마 CVD 방법에 의한 TiN barrier metal 형성과 특성-
dc.title.alternativeCharacteristics of TiN Barrier Metal Prepared by High Density Plasma CVD Method-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume9-
dc.citation.issue11-
dc.citation.beginningpage1129-
dc.citation.endingpage1136-
dc.citation.publicationname한국재료학회지-
dc.contributor.localauthor이정용-
dc.contributor.nonIdAuthor최치규-
dc.contributor.nonIdAuthor강민성-
dc.contributor.nonIdAuthor오경숙-
dc.contributor.nonIdAuthor이유성-
dc.contributor.nonIdAuthor오대현-
dc.contributor.nonIdAuthor황찬용-
dc.contributor.nonIdAuthor손종원-
dc.contributor.nonIdAuthor김건호-
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