ECR 산소 플라즈마를 이용한 저온 열산화Low Temperature Thermal Oxidation using ECR Oxygen Plasma
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 이정렬 | ko |
| dc.contributor.author | 강석원 | ko |
| dc.contributor.author | 이진우 | ko |
| dc.contributor.author | 한철희 | ko |
| dc.contributor.author | 김충기 | ko |
| dc.date.accessioned | 2013-02-27T11:46:02Z | - |
| dc.date.available | 2013-02-27T11:46:02Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1995-03 | - |
| dc.identifier.citation | 전자공학회논문지, v.32, no.3, pp.461 - 470 | - |
| dc.identifier.issn | 1016-135X | - |
| dc.identifier.uri | http://hdl.handle.net/10203/68357 | - |
| dc.language | Korean | - |
| dc.publisher | 대한전자공학회 | - |
| dc.title | ECR 산소 플라즈마를 이용한 저온 열산화 | - |
| dc.title.alternative | Low Temperature Thermal Oxidation using ECR Oxygen Plasma | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 32 | - |
| dc.citation.issue | 3 | - |
| dc.citation.beginningpage | 461 | - |
| dc.citation.endingpage | 470 | - |
| dc.citation.publicationname | 전자공학회논문지 | - |
| dc.contributor.localauthor | 한철희 | - |
| dc.contributor.nonIdAuthor | 이정렬 | - |
| dc.contributor.nonIdAuthor | 강석원 | - |
| dc.contributor.nonIdAuthor | 이진우 | - |
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