Ta(OC2H5)와 NH3를 이용한 산화탄탈륨 막의 원자층 증착 및 특성Atomic Layer Deposition Characterization of Tantalum Oxide Films Using Ta(OC2H5)5NH3
- Publisher
- 한국재료학회
- Issue Date
- 1998-01
- Language
- Korean
- Citation
한국재료학회지, v.8, no.10, pp.945 - 949
- ISSN
- 1225-0562
- Appears in Collection
- MS-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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