Monte Carlo Simulation of Electron Beam Lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | G.S. Cho | ko |
| dc.contributor.author | 최덕인 | ko |
| dc.date.accessioned | 2013-02-25T14:41:32Z | - |
| dc.date.available | 2013-02-25T14:41:32Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1988 | - |
| dc.identifier.citation | 새물리, v.28, no.5, pp.565 - 573 | - |
| dc.identifier.issn | 0374-4914 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/62940 | - |
| dc.language | Korean | - |
| dc.publisher | 한국물리학회 | - |
| dc.title | Monte Carlo Simulation of Electron Beam Lithography | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 28 | - |
| dc.citation.issue | 5 | - |
| dc.citation.beginningpage | 565 | - |
| dc.citation.endingpage | 573 | - |
| dc.citation.publicationname | 새물리 | - |
| dc.contributor.nonIdAuthor | G.S. Cho | - |
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