Monte Carlo Simulation of Electron Beam Lithography in Resist Films Containing Heavy Metals
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | G.S. Cho | ko |
| dc.contributor.author | Choi, Duk In | ko |
| dc.date.accessioned | 2013-02-25T14:37:53Z | - |
| dc.date.available | 2013-02-25T14:37:53Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1988-09 | - |
| dc.identifier.citation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.21, no.3, pp.267 - 277 | - |
| dc.identifier.issn | 0374-4884 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/62921 | - |
| dc.language | Korean | - |
| dc.publisher | Korean Physical Soc | - |
| dc.title | Monte Carlo Simulation of Electron Beam Lithography in Resist Films Containing Heavy Metals | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 21 | - |
| dc.citation.issue | 3 | - |
| dc.citation.beginningpage | 267 | - |
| dc.citation.endingpage | 277 | - |
| dc.citation.publicationname | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
| dc.contributor.nonIdAuthor | G.S. Cho | - |
- Appears in Collection
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.