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Results 1-7 of 7 (Search time: 0.01 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1
Electron and ion kinetics in magnetized capacitively coupled plasma source

Lee, SH; You, SJ; Chang, Hong-Young; Lee, JK, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.25, pp.455 - 463, 2007-05

2
Power dissipation and mode transition in an RF discharge with multi-hollow cathode electrode

Lee, Yun-Seong; Lee, Hun-Su; Chang, Hong-Young, THIN SOLID FILMS, v.518, pp.6682 - 6685, 2010-09

3
Role of transverse magnetic field in the capacitive discharge

You, SJ; Hai, TT; Park, M; Kim, DW; Kim, JH; Seong, DJ; Shin, YH; Lee, SH; Park, GY; Lee, JK; Chang, Hong-Young, THIN SOLID FILMS, v.519, pp.6981 - 6989, 2011-08

4
Three-step decay of the plasma density near the substrate in pulsed-dc magnetron sputtering discharge

In, Jung Hwan; Na, Byung Keun; Seo, SH; Chang, Hong-Young; Han, JG, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.18, 2009-11

5
A study on ion energy distribution functions and plasma potentials in helicon wave plasmas

Kim, JH; Chang, Hong-Young, PHYSICS OF PLASMAS, v.3, no.4, pp.1462 - 1469, 1996-04

6
Capacitive Electron Cooling in an Inductively Coupled Plasma Source/Capacitively Coupled Plasma Bias Reactor

Jun, Hyun-Su; Lee, Dong-Seok; Chang, Hong-Young, JAPANESE JOURNAL OF APPLIED PHYSICS, v.52, no.10, 2013-10

7
The discharge condition to enhance electron density of capacitively coupled plasma with multi-holed electrode

Lee, Hun-Su; Lee, Yun-Seong; Chang, Hong-Young, PHYSICS OF PLASMAS, v.19, no.9, 2012-09

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