Results 1-10 of 19 (Search time: 0.009 seconds).
NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
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Effects of substrate bias voltage on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.9, pp.4246 - 4250, 2001-09 | |
On inductively coupled plasmas for next-generation processing Lee, YK; Lee, DS; Bai, KH; Chung, CW; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.169, pp.20 - 23, 2003-06 | |
Control of ion species in inductively coupled oxidation plasma by inert gas mixing Bai, KH; Chang, Hong-Young, JOURNAL OF APPLIED PHYSICS, v.100, pp.443 - 448, 2006-12 | |
Study on the mode transitions for rf power dissipation in capacitively coupled plasma You, SJ; Ahn, SK; Chang, Hong-Young, SURFACE & COATINGS TECHNOLOGY, v.193, pp.81 - 87, 2005-04 | |
Effective design of multiple hollow cathode electrode to enhance the density of rf capacitively coupled plasma Lee, Hun-Su; Lee, Yun-Seong; Seo, S. H.; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.97, no.8, 2010-08 | |
Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06 | |
Temporal evolution of electron energy distribution function and plasma parameters in the afterglow of drifting magnetron plasma Seo, SH; In, JH; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.14, pp.576 - 580, 2005-08 | |
Pressure and helium mixing effects on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; Chung, CW; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.7, pp.3498 - 3501, 2001-07 | |
Time evolution of electronegativity in a pulsed inductively coupled oxygen plasma Lee, Jeong-Beom; Seo, Sang-Hun; Chang, Hong-Young, THIN SOLID FILMS, v.518, pp.6573 - 6577, 2010-09 | |
Electrical characteristics of helicon wave plasmas Yun, SM; Kim, JH; Chang, Hong-Young, IEEE TRANSACTIONS ON PLASMA SCIENCE, v.26, no.2, pp.159 - 166, 1998-04 |
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