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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Effects of substrate bias voltage on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; You, SJ; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.9, pp.4246 - 4250, 2001-09 | |
| Diode laser-induced fluorescence measurements of metastable argon ions in a magnetized inductively coupled plasma Jun, S; Chang, Hong-Young; McWilliams, R, PHYSICS OF PLASMAS, v.13, pp.122 - 123, 2006-05 | |
| Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06 | |
| Pressure and helium mixing effects on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; Chung, CW; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.7, pp.3498 - 3501, 2001-07 | |
| Electron temperature control with a small mesh number grid in inductively coupled plasmas Bai, KH; Choi, CK; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.13, pp.662 - 667, 2004-11 | |
| Plasma parameters analysis of various mixed gas inductively coupled plasmas Bai, KH; You, SJ; Chang, Hong-Young; Uhm, HS, PHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838, 2002-06 | |
| The effects of mixing molecular gases on plasma parameters in a system with a grid-controlled electron temperature Bai, KH; Hong, JI; You, SJ; Choi, CK; Chang, Hong-Young, PHYSICS OF PLASMAS, v.9, no.3, pp.1025 - 1028, 2002-03 | |
| Electron temperature control with grid bias in inductively coupled argon plasma Hong, JI; Seo, SH; Kim, SS; Yoon, NS; Chang, Choong-Seock; Chang, Hong-Young, PHYSICS OF PLASMAS, v.6, no.3, pp.1017 - 1028, 1999-03 |
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