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Results 1-10 of 16 (Search time: 0.009 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1
Development of a dual inductively coupled plasma source for direct and remote plasma generation in a reactor

Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS REVIEW PAPERS, v.44, no.2, pp.1081 - 1085, 2005-02

2
Mode transition for power dissipation induced by driving frequency in capacitively coupled plasma

You, SJ; Kim, HC; Chung, CW; Chang, Hong-Young; Lee, JK, JOURNAL OF APPLIED PHYSICS, v.94, pp.7422 - 7426, 2003-12

3
On inductively coupled plasmas for next-generation processing

Lee, YK; Lee, DS; Bai, KH; Chung, CW; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.169, pp.20 - 23, 2003-06

4
The electron bounce resonance in a low-pressure solenoidal inductive discharge

Chung, CW; You, KI; Seo, SH; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.6, pp.2992 - 2997, 2001-06

5
Review of heating mechanism in inductively coupled plasma

Seo, SH; Chung, CW; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.131, no.1-3, pp.1 - 11, 2000-09

6
Theoretical investigation of the evolution of electron energy distribution functions in inductively coupled discharges

Kim, SS; Chung, CW; Chang, Hong-Young, THIN SOLID FILMS, v.435, pp.72 - 77, 2003-07

7
Nonlocal electron kinetics in a planar inductive helium discharge

Seo, SH; Chung, CW; Hong, JI; Chang, Hong-Young, PHYSICAL REVIEW E, v.62, no.5, pp.7155 - 7167, 2000-11

8
Characterization of pulsed plasma in unbalanced magnetron argon discharge

Lee, SW; Seo, SH; In, JH; Chung, CW; Chang, Hong-Young, PHYSICS OF PLASMAS, v.12, pp.297 - 301, 2005-06

9
Pressure and helium mixing effects on plasma parameters in temperature control using a grid system

Bai, KH; Hong, JI; Chung, CW; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.7, pp.3498 - 3501, 2001-07

10
On a dual inductively coupled plasma for direct and remote plasma in a reactor

Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, PHYSICS OF PLASMAS, v.11, pp.4830 - 4836, 2004-10

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