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Results 1-3 of 3 (Search time: 0.006 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1
Development of a dual inductively coupled plasma source for direct and remote plasma generation in a reactor

Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS REVIEW PAPERS, v.44, no.2, pp.1081 - 1085, 2005-02

2
On a dual inductively coupled plasma for direct and remote plasma in a reactor

Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, PHYSICS OF PLASMAS, v.11, pp.4830 - 4836, 2004-10

3
Anomalous behaviors of plasma parameters in unbalanced direct-current magnetron discharge

Seo, SH; Chang, Hong-Young, PHYSICS OF PLASMAS, v.11, pp.3595 - 3601, 2004-07

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