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NO	Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1	Development of a dual inductively coupled plasma source for direct and remote plasma generation in a reactor Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS REVIEW PAPERS, v.44, no.2, pp.1081 - 1085, 2005-02
2	On a dual inductively coupled plasma for direct and remote plasma in a reactor Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, PHYSICS OF PLASMAS, v.11, pp.4830 - 4836, 2004-10
3	Electron transport in the downstream region of planar unbalanced magnetron discharge Seo, SH; Chang, Hong-Young, JOURNAL OF APPLIED PHYSICS, v.96, pp.1310 - 1317, 2004-08
4	Anomalous behaviors of plasma parameters in unbalanced direct-current magnetron discharge Seo, SH; Chang, Hong-Young, PHYSICS OF PLASMAS, v.11, pp.3595 - 3601, 2004-07
5	A study on the formation and characteristics of the Si-O-C-H composite thin films with low dielectric constant for advanced semiconductor devices Yang, CS; Oh, KS; Ryu, JY; Kim, DC; Shou-Yong, J; Choi, CK; Lee, HJ; Um, SH; Chang, Hong-Young, THIN SOLID FILMS, v.390, no.1-2, pp.113 - 118, 2001-06

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