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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Development of a dual inductively coupled plasma source for direct and remote plasma generation in a reactor Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS REVIEW PAPERS, v.44, no.2, pp.1081 - 1085, 2005-02 | |
| On a dual inductively coupled plasma for direct and remote plasma in a reactor Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, PHYSICS OF PLASMAS, v.11, pp.4830 - 4836, 2004-10 |
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