DSpace at KOASAS: Search

Results 1-3 of 3 (Search time: 0.005 seconds).

NO	Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1	Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06
2	Electron temperature control with a small mesh number grid in inductively coupled plasmas Bai, KH; Choi, CK; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.13, pp.662 - 667, 2004-11
3	Electron temperature control with grid bias in inductively coupled argon plasma Hong, JI; Seo, SH; Kim, SS; Yoon, NS; Chang, Choong-Seock; Chang, Hong-Young, PHYSICS OF PLASMAS, v.6, no.3, pp.1017 - 1028, 1999-03

Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)

Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06

Bai, KH; Choi, CK; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.13, pp.662 - 667, 2004-11

Hong, JI; Seo, SH; Kim, SS; Yoon, NS; Chang, Choong-Seock; Chang, Hong-Young, PHYSICS OF PLASMAS, v.6, no.3, pp.1017 - 1028, 1999-03

Discover

KOASAS