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Results 11-20 of 32 (Search time: 0.006 seconds).
| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| The trend of electron temperature and electron density in the process of microcrystalline silicon solar cells Lee, Yun-Seong; In, Jung-Hwan; Ahn, Seung-Kyu; Seo, Sang-Hun; Chang, Hong-Young; You, Dong-Joo; Ahn, Seh-Won; Lee, Heon-Min, CURRENT APPLIED PHYSICS, v.10, pp.S234 - S236, 2010-03 | |
| A simple analysis on the abnormal behavior of the argon metastable density in an inductively coupled Ar plasma Park, Min; Chang, Hong-Young; You, Shin-Jae; Kim, Jung-Hyung; Seong, Dae-Jin; Shin, Yong-Hyeon, THIN SOLID FILMS, v.518, pp.6694 - 6699, 2010-09 | |
| Evolution of electron temperature in low pressure magnetized capacitive plasma You, S. J.; Park, G. Y.; Kwon, J. H.; Kim, J. H.; Chang, Hong-Young; Lee, J. K.; Seong, D. J.; Shin, Y. H., APPLIED PHYSICS LETTERS, v.96, no.10, 2010-03 | |
| Cutoff probe using Fourier analysis for electron density measurement Na, Byung-Keun; You, Kwang-Ho; Kim, Dae-Woong; Chang, Hong-Young; You, Shin-Jae; Kim, Jung-Hyung, REVIEW OF SCIENTIFIC INSTRUMENTS, v.83, no.1, 2012-01 | |
| The characteristics of the multi-hole RF capacitively coupled plasma discharged with neon, argon and krypton Lee, H. S.; Lee, Yun-Seong; Seo, S. H.; Chang, Hong-Young, THIN SOLID FILMS, v.519, pp.6955 - 6959, 2011-08 | |
| Plasma density measurement with ring-type cutoff probe Kim, D. W.; You, S. J.; Na, Byungkeun; Kim, J. H.; Shin, YH; Chang, Hong-Young; Oh, Wang-Yuhl, THIN SOLID FILMS, v.547, pp.280 - 284, 2013-11 | |
| Measurement of effective sheath width around cutoff probe in low-pressure plasmas Kim, Dongwook; You, S. J.; Kim, J. H.; Chang, Hong-Young; Oh, Wang-Yuhl, PHYSICS OF PLASMAS, v.21, no.5, 2014-05 | |
| Collisional effect on the time evolution of ion energy distributions outside the sheath during the afterglow of pulsed inductively coupled plasmas Lee, J. B.; Chang, Hong-Young; Seo, S. H., PLASMA SOURCES SCIENCE & TECHNOLOGY, v.22, no.6, 2013-12 | |
| Capacitive Electron Cooling in an Inductively Coupled Plasma Source/Capacitively Coupled Plasma Bias Reactor Jun, Hyun-Su; Lee, Dong-Seok; Chang, Hong-Young, JAPANESE JOURNAL OF APPLIED PHYSICS, v.52, no.10, 2013-10 | |
| A cutoff probe for the measurement of high density plasma You, Kwang-Ho; You, S. J.; Kim, D. W.; Na, Byung-Keun; Seo, Byong-Hoon; Kim, J. H.; Shin, Y. H.; Seong, D. J.; Chang, Hong-Young, THIN SOLID FILMS, v.547, pp.250 - 255, 2013-11 |