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NO	Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1	Capacitive Electron Cooling in an Inductively Coupled Plasma Source/Capacitively Coupled Plasma Bias Reactor Jun, Hyun-Su; Lee, Dong-Seok; Chang, Hong-Young, JAPANESE JOURNAL OF APPLIED PHYSICS, v.52, no.10, 2013-10
2	On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes Lee, Jinwon; Lee, Yun-Seong; Chang, Hong-Young; An, Sang-Hyuk, PHYSICS OF PLASMAS, v.21, no.8, 2014-08
3	Effect of reactor surface modification on the neutral gas temperature in a transformer-coupled toroidal plasma You, Daeho; Lee, Yun-Seong; Lee, Jeong Beom; Chang, Hong-Young, CURRENT APPLIED PHYSICS, v.15, no.3, pp.183 - 189, 2015-03

Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)

Jun, Hyun-Su; Lee, Dong-Seok; Chang, Hong-Young, JAPANESE JOURNAL OF APPLIED PHYSICS, v.52, no.10, 2013-10

Lee, Jinwon; Lee, Yun-Seong; Chang, Hong-Young; An, Sang-Hyuk, PHYSICS OF PLASMAS, v.21, no.8, 2014-08

You, Daeho; Lee, Yun-Seong; Lee, Jeong Beom; Chang, Hong-Young, CURRENT APPLIED PHYSICS, v.15, no.3, pp.183 - 189, 2015-03

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