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Results 31-40 of 75 (Search time: 0.006 seconds).
| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Effect of duty cycle on plasma parameters in the pulsed dc magnetron argon discharge Seo, SH; In, JH; Chang, Hong-Young; Han, JG, APPLIED PHYSICS LETTERS, v.86, pp.361 - 376, 2005-06 | |
| Control and analysis of ion species in inductively coupled nitration plasma using a grid system Bai, KH; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.87, pp.299 - 308, 2005-09 | |
| Temporal evolution of electron energy distribution function and plasma parameters in the afterglow of drifting magnetron plasma Seo, SH; In, JH; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.14, pp.576 - 580, 2005-08 | |
| Pressure and helium mixing effects on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; Chung, CW; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.7, pp.3498 - 3501, 2001-07 | |
| Paradoxical sheath width variation in transversely magnetized capacitive coupled plasma You, SJ; Bai, KH; In, JH; Chang, Hong-Young; Choi, CK, SURFACE & COATINGS TECHNOLOGY, v.171, pp.226 - 230, 2003-07 | |
| Gap length effect on electron energy distribution in capacitive radio frequency discharges You, S. J.; Kim, S. S.; Kim, Jung-Hyung; Seong, Dae-Jin; Shin, Yong-Hyeon; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.91, no.22, 2007-11 | |
| Three-step decay of the plasma density near the substrate in pulsed-dc magnetron sputtering discharge In, Jung Hwan; Na, Byung Keun; Seo, SH; Chang, Hong-Young; Han, JG, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.18, 2009-11 | |
| The nonlocal and local property of the electron energy distribution function in a low-pressure inductively coupled plasma Chung, C; Chang, Hong-Young, PHYSICS OF PLASMAS, v.7, no.9, pp.3826 - 3828, 2000-09 | |
| KDAS: General-purpose data acquisition system developed for KAIST-Tokamak Seo, SH; Choe, Wonho; Chang, Hong-Young; Jeong, SH, FUSION TECHNOLOGY, v.37, no.1, pp.89 - 95, 2000-01 | |
| Si etching rate calculation for low pressure high density plasma source using Cl-2 gas Lee, YD; Chang, Hong-Young; Chang, Choong-Seock, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A-VACUUM SURFACES AND FILMS, v.18, no.5, pp.2224 - 2229, 2000 |