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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Electron drift and the loss balance of charged particles in planar-unbalanced dc magnetron discharge Seo, SH; In, JH; Chang, Hong-Young, JOURNAL OF APPLIED PHYSICS, v.97, pp.335 - 347, 2005-01 | |
| Efficient electron heating in short-pulsed magnetron discharges Seo, SH; In, JH; Chang, Hong-Young, JOURNAL OF APPLIED PHYSICS, v.98, pp.1765 - 1773, 2005-10 | |
| Experimental investigation of plasma dynamics in dc and short-pulse magnetron discharges Seo, SH; In, JH; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.15, pp.256 - 265, 2006-05 | |
| Time evolution of electron energy distribution function and plasma parameters in pulsed and unbalanced magnetron argon discharge Seo, SH; In, JH; Chang, Hong-Young; Han, JG, JOURNAL OF APPLIED PHYSICS, v.98, pp.8471 - 8477, 2005-08 | |
| Characterization of pulsed plasma in unbalanced magnetron argon discharge Lee, SW; Seo, SH; In, JH; Chung, CW; Chang, Hong-Young, PHYSICS OF PLASMAS, v.12, pp.297 - 301, 2005-06 | |
| Effect of duty cycle on plasma parameters in the pulsed dc magnetron argon discharge Seo, SH; In, JH; Chang, Hong-Young; Han, JG, APPLIED PHYSICS LETTERS, v.86, pp.361 - 376, 2005-06 | |
| Temporal evolution of electron energy distribution function and plasma parameters in the afterglow of drifting magnetron plasma Seo, SH; In, JH; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.14, pp.576 - 580, 2005-08 | |
| Paradoxical sheath width variation in transversely magnetized capacitive coupled plasma You, SJ; Bai, KH; In, JH; Chang, Hong-Young; Choi, CK, SURFACE & COATINGS TECHNOLOGY, v.171, pp.226 - 230, 2003-07 | |
| Effects of a sheath boundary on electron energy distribution in Ar/He dc magnetron discharges Seo, SH; In, JH; Chang, Hong-Young, JOURNAL OF APPLIED PHYSICS, v.96, pp.57 - 64, 2004-07 | |
| Measurements of electron energy distribution functions and electron transport in the downstream region of an unbalanced dc magnetron discharge Seo, SH; In, JH; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.13, no.3, pp.409 - 419, 2004-08 |
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