Results 11-13 of 13 (Search time: 0.005 seconds).
NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
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Plasma parameters analysis of various mixed gas inductively coupled plasmas Bai, KH; You, SJ; Chang, Hong-Young; Uhm, HS, PHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838, 2002-06 | |
Characterization of a high-frequency inductively coupled plasma source Lee, DS; Jun, HS; Chang, Hong-Young, THIN SOLID FILMS, v.506, pp.469 - 473, 2006-05 | |
A novel pulsing method for the enhancement of the deposition rate in high power pulsed magnetron sputtering In, Jung-Hwan; Seo, Sang-Hun; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.202, no.22-23, pp.5298 - 5301, 2008-08 |
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