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Results 11-13 of 13 (Search time: 0.005 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
11
Plasma parameters analysis of various mixed gas inductively coupled plasmas

Bai, KH; You, SJ; Chang, Hong-Young; Uhm, HS, PHYSICS OF PLASMAS, v.9, no.6, pp.2831 - 2838, 2002-06

12
Characterization of a high-frequency inductively coupled plasma source

Lee, DS; Jun, HS; Chang, Hong-Young, THIN SOLID FILMS, v.506, pp.469 - 473, 2006-05

13
A novel pulsing method for the enhancement of the deposition rate in high power pulsed magnetron sputtering

In, Jung-Hwan; Seo, Sang-Hun; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.202, no.22-23, pp.5298 - 5301, 2008-08

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