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NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
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On inductively coupled plasmas for next-generation processing Lee, YK; Lee, DS; Bai, KH; Chung, CW; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.169, pp.20 - 23, 2003-06 | |
Characterization of a high-frequency inductively coupled plasma source Lee, DS; Jun, HS; Chang, Hong-Young, THIN SOLID FILMS, v.506, pp.469 - 473, 2006-05 |
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