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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Development of a dual inductively coupled plasma source for direct and remote plasma generation in a reactor Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS REVIEW PAPERS, v.44, no.2, pp.1081 - 1085, 2005-02 | |
| Efficient electron heating in short-pulsed magnetron discharges Seo, SH; In, JH; Chang, Hong-Young, JOURNAL OF APPLIED PHYSICS, v.98, pp.1765 - 1773, 2005-10 | |
| Time evolution of electron energy distribution function and plasma parameters in pulsed and unbalanced magnetron argon discharge Seo, SH; In, JH; Chang, Hong-Young; Han, JG, JOURNAL OF APPLIED PHYSICS, v.98, pp.8471 - 8477, 2005-08 |
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