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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Control of ion species in inductively coupled oxidation plasma by inert gas mixing Bai, KH; Chang, Hong-Young, JOURNAL OF APPLIED PHYSICS, v.100, pp.443 - 448, 2006-12 | |
| Highly selective SiO2 etching in low-electron-temperature inductively coupled plasma Bai, KH; Chang, Hong-Young; Kwon, GC; Kim, HS; Kim, JS, JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, pp.3602 - 3604, 2007-06 | |
| Electron temperature control with a small mesh number grid in inductively coupled plasmas Bai, KH; Choi, CK; Chang, Hong-Young, PLASMA SOURCES SCIENCE & TECHNOLOGY, v.13, pp.662 - 667, 2004-11 | |
| Control and analysis of ion species in N-2 inductively coupled plasma with inert gas mixing Bai, KH; Lee, DS; Chang, Hong-Young; Uhm, HS, APPLIED PHYSICS LETTERS, v.80, no.21, pp.3907 - 3909, 2002-05 |