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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Development of a dual inductively coupled plasma source for direct and remote plasma generation in a reactor Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS REVIEW PAPERS, v.44, no.2, pp.1081 - 1085, 2005-02 | |
| Pressure and helium mixing effects on plasma parameters in temperature control using a grid system Bai, KH; Hong, JI; Chung, CW; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.7, pp.3498 - 3501, 2001-07 | |
| Experimental measurement of the electron energy distribution function in the radio frequency electron cyclotron resonance inductive discharge Chung, CW; Kim, SS; Chang, Hong-Young, PHYSICAL REVIEW E, v.69, pp.97 - 102, 2004-01 |
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