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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Development of a dual inductively coupled plasma source for direct and remote plasma generation in a reactor Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS REVIEW PAPERS, v.44, no.2, pp.1081 - 1085, 2005-02 | |
| Characterization of pulsed plasma in unbalanced magnetron argon discharge Lee, SW; Seo, SH; In, JH; Chung, CW; Chang, Hong-Young, PHYSICS OF PLASMAS, v.12, pp.297 - 301, 2005-06 | |
| Feature of electron energy distribution in a low-pressure capacitive discharge You, SJ; Chung, CW; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.87, pp.3751 - 3762, 2005-07 |
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