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NO	Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1	Low-dielectric-constant-film deposition with various gases in a helicon plasma reactor Yun, SM; Chang, Hong-Young; Oh, KS; Choi, CK, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.38, no.7B, pp.4531 - 4534, 1999-07
2	Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition Oh, KS; Kang, MS; Lee, KM; Kim, DS; Choi, CK; Yun, SM; Chang, Hong-Young; Kim, KH, THIN SOLID FILMS, v.345, no.1, pp.45 - 49, 1999-05
3	SiOF film deposition using FSi(OC2H5)(3) gas in a helicon plasma source Yun, SM; Chang, Hong-Young; Lee, KM; Kim, DC; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.145, no.7, pp.2576 - 2580, 1998-07
4	Low dielectric constant CF/SiOF composite film deposition in a helicon plasma reactor Yun, SM; Chang, Hong-Young; Kang, MS; Choi, CK, THIN SOLID FILMS, v.341, no.1-2, pp.109 - 111, 1999-03

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