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NO	Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1	The deposition of SiOF film with low dielectric constant in a helicon plasma source Kim, JH; See, SH; Yun, SM; Chang, Hong-Young; Lee, KM; Choi, CK, APPLIED PHYSICS LETTERS, v.68, no.11, pp.1507 - 1509, 1996-03
2	Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition Oh, KS; Kang, MS; Lee, KM; Kim, DS; Choi, CK; Yun, SM; Chang, Hong-Young; Kim, KH, THIN SOLID FILMS, v.345, no.1, pp.45 - 49, 1999-05
3	A study on low dielectric material deposition using a helicon plasma source Kim, JH; Seo, SH; Yun, SM; Chang, Hong-Young; Lee, KM; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.143, no.9, pp.2990 - 2995, 1996-09
4	SiOF film deposition using FSi(OC2H5)(3) gas in a helicon plasma source Yun, SM; Chang, Hong-Young; Lee, KM; Kim, DC; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.145, no.7, pp.2576 - 2580, 1998-07

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