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NO	Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1	Development of a dual inductively coupled plasma source for direct and remote plasma generation in a reactor Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS REVIEW PAPERS, v.44, no.2, pp.1081 - 1085, 2005-02
2	The electron bounce resonance in a low-pressure solenoidal inductive discharge Chung, CW; You, KI; Seo, SH; Kim, SS; Chang, Hong-Young, PHYSICS OF PLASMAS, v.8, no.6, pp.2992 - 2997, 2001-06
3	Review of heating mechanism in inductively coupled plasma Seo, SH; Chung, CW; Chang, Hong-Young, SURFACE COATINGS TECHNOLOGY, v.131, no.1-3, pp.1 - 11, 2000-09
4	Nonlocal electron kinetics in a planar inductive helium discharge Seo, SH; Chung, CW; Hong, JI; Chang, Hong-Young, PHYSICAL REVIEW E, v.62, no.5, pp.7155 - 7167, 2000-11
5	On a dual inductively coupled plasma for direct and remote plasma in a reactor Uhm, S; Lee, KH; Chang, Hong-Young; Chung, CW, PHYSICS OF PLASMAS, v.11, pp.4830 - 4836, 2004-10
6	Heating-mode transition in the capacitive mode of inductively coupled plasmas Chung, CW; Chang, Hong-Young, APPLIED PHYSICS LETTERS, v.80, no.10, pp.1725 - 1727, 2002-03
7	The finite size effect in a planar inductively coupled plasma Chung, CW; Kim, SS; Seo, SH; Chang, Hong-Young; Yoon, NS, JOURNAL OF APPLIED PHYSICS, v.88, no.2, pp.1181 - 1183, 2000-07

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