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Results 1-1 of 1 (Search time: 0.001 seconds).

NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1
SiOF film deposition using FSi(OC2H5)(3) gas in a helicon plasma source

Yun, SM; Chang, Hong-Young; Lee, KM; Kim, DC; Choi, CK, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.145, no.7, pp.2576 - 2580, 1998-07

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