Search
Results 1-1 of 1 (Search time: 0.003 seconds).
| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Formation and characterization of the fluorocarbonated-SiO2 films by O-2/FTES-helicon plasma chemical vapor deposition Oh, KS; Kang, MS; Lee, KM; Kim, DS; Choi, CK; Yun, SM; Chang, Hong-Young; Kim, KH, THIN SOLID FILMS, v.345, no.1, pp.45 - 49, 1999-05 |