Formation of shallow phosphorus layers by rapid thermal processing using a solid diffusion source

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dc.contributor.authork. t. kimko
dc.contributor.authorc. k. kimko
dc.contributor.authorb. j. choko
dc.contributor.authork. g. kimko
dc.date.accessioned2013-02-25T11:38:18Z-
dc.date.available2013-02-25T11:38:18Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1988-09-
dc.identifier.citationJOURNAL OF THE KOREA INSTITUTE OF ELECTRONIC ENGINEERS, v.1, no.2, pp.105 - 109-
dc.identifier.issn1013-0780-
dc.identifier.urihttp://hdl.handle.net/10203/61926-
dc.languageEnglish-
dc.publisher대한전기학회-
dc.titleFormation of shallow phosphorus layers by rapid thermal processing using a solid diffusion source-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume1-
dc.citation.issue2-
dc.citation.beginningpage105-
dc.citation.endingpage109-
dc.citation.publicationnameJOURNAL OF THE KOREA INSTITUTE OF ELECTRONIC ENGINEERS-
dc.contributor.localauthorb. j. cho-
dc.contributor.nonIdAuthork. t. kim-
dc.contributor.nonIdAuthork. g. kim-
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EE-Journal Papers(저널논문)
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