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Showing results 1 to 6 of 6

1
A PED-stabilized Chemically Amplified Resist

Kim, Jin-Baek; Choi, Jae-Hak; Jung, Min Ho; Kim, Hyun-Woo, 한국고분자학회 1997년도 추계 학술대회 , pp.329 - 330, 한국고분자학회, 1997-10-11

2
Environmentally stable chemically amplified positive resist containing vinyllactam terpolymers

Bok, Cheol Kyu; Koh, Cha-Won; Baik, Ki Ho; Kim, Jin-Baek; Jung, Min Ho; Cheong, Jong-Ho, Advances in Resist Technology and Processing XIV, v.3049, pp.501 - 511, SPIE, 1997-01

3
Excimer Laser Photoresists Using Alicyclic Matrix Polymers

Kim, Jin-Baek; Jung, Min Ho; Kim, Hyun-Woo; Chun, Sung-Deuk, 36th IUPAC International Symposium on Macromolecules, pp.461 - 461, 1996-08-04

4
Synthesis and Lithographic Characterization of Poly(hydroxystyrene-co-tert-butyl acrylate-co-3-(t-butoxycarbonyl)-1-vinylcaprolactam

Kim, Jin-Baek; Jung, Min Ho; Jung, Jong Ho, 한국고분자학회 1996년도추계 학술대회 , v.21, no.2, pp.714 - 715, 한국고분자학회, 1996-10

5
T-top Free Chemically Amplified Resists Containing Vinyllactam Derivatives

Jung, Min Ho; Kim, Jin-Baek, 한국고분자학회 1997년도 춘계 학술대회, pp.108 - 109, 한국고분자학회, 1997-04

6
The Novel Water Developable Photoresist for Deep UV Lithography

Jung, Min Ho; Kim, Jin-Baek, 한국고분자학회 1996년도 춘계 학술대회 , pp.196 - 197, 한국고분자학회, 1996-04

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