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Chemically Amplified Resists based on Acrylate Polymers containing Ketal Groups in the Side Chains Kim, Jin-Baek; Park, Jong-Jin; Jang, Ji-Hyun, SPIE-The International Society for Optical Engineering, pp.625 - 632, SPIE, 1999-01 |
Water-developable resists based on glyceryl methacrylate for 193-nm lithography Kim, Jin-Baek; Jang, Ji-Hyun; Choi, Jae-Hak; Lee, Kwan-Ku; Ko, Jong-Sung, Advances in Resist Technology and Processing XXI, v.5376, pp.616 - 624, 2004-02-23 |
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