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Showing results 1 to 8 of 8

1
A Combined Approach of Molecular-Assembly and Photolithography to Produce Biocompatible Micropatterns

Lee, Hyun-Jung; Ganesan, Ramakrishnan; Min, Chang-su; Kim, Jin-Baek, American Chemical Society, 2008-08-17

2
Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for 193-nm Lithography

Ganesan, Ramakrishnan; Choi, Jae-Hak; Kim, Kyoung-Seon; Oh, Tae-Hwan; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, SPIE-The International Society for Optical Engineering, pp.0, SPIE, 2005-02-27

3
Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for Deep-UV Lithography

Ganesan, Ramakrishnan; Kim, Jin-Baek, Korea-Japan Young Scientist Symposium on polymers, 2005, pp.0 - 0, JSPS, KOSEF, 2005-09-30

4
Negative nanomolecular resists based on calix[4]resocinarene

Oh, Tae-Hwan; Ganesan, Ramakrishnan; Yoon, Je-Moon; Kim, Jin-Baek, Advances in Resist Technology and Processing XXIII, SPIE, 2006-02-20

5
Negative Tone Resist Material Based on Polyhedral Oligomeric Silsesquioxane for 193 nm Lithography

Kim, Jin-Baek; Ganesan, Ramakrishnan, 한국고분자학회 2003년도 추계학술대회, pp.0 - 0, 한국고분자학회, 2003-10

6
Nonchemically amplified resists for deep UV lithography

Ganesan, Ramakrishnan; Kim, Sumin; Youn, Seul Ki; Cho, Yungook; Yun, Jei Moon; Kim, Jin-Baek, Advances in Resist Materials and Processing Technology XXIV, SPIE, 2007-02-26

7
Protein patterning on the polyethylene suface by radiation grafting

Kim, Dong Ki; Choi, Jae Hak; Jung, Chan Hee; Kwon, Ho Je; Hwang, In Tae; No, Young Chang; Ganesan, Ramakrishnan; et al, 한국고분자학회 2008년 춘계 학술대회 , pp.0 - 0, 한국고분자학회, 2008-04-10

8
Top surface imaging study by selective chemisorptions of poly(dimethyl siloxane) on diazoketo-functionalized polymeric surface

Ganesan, Ramakrishnan; Youn, Seul Ki; Yun, Jei Moon; Kim, Jin-Baek, 24th European Mask and Lithography Conference, EMLC 2008, 2008-01-21

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