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Showing results 1 to 12 of 12

1
A PED-stabilized Chemically Amplified Resist

Kim, Jin-Baek; Choi, Jae-Hak; Jung, Min Ho; Kim, Hyun-Woo, 한국고분자학회 1997년도 추계 학술대회 , pp.329 - 330, 한국고분자학회, 1997-10-11

2
A study on evaporation of photogenerated acid and base additives in chemically amplified positive resists

Kim, Jin-Baek; Kwon, Young-Gil; Choi, Jae-Hak, 한국고분자학회 1998년도 추계 학술대회 , pp.264 - 265, 한국고분자학회, 1998-10

3
Acid Diffusion and Evaporation in Chemically Amplified Resists

Kim, Jin-Baek; Kwon, Young-Gil; Choi, Jae-Hak, Advances in Resist Technology and Processing XV, pp.536 - 543, SPIE, 1999-03-15

4
Acid Diffusion Control in Chemically Amplified Positive Resists

Kwon, Young-Gil; Choi, Jae-Hak; Kim, Jin-Baek, 한국고분자학회 1998년도 춘계 학술대회 , pp.36 - 37, 한국고분자학회, 1998-04

5
Bilayer Resists Based on Polyhedral Oligomeric Silsesquioxane for 193-nm Lithography

Ganesan, Ramakrishnan; Choi, Jae-Hak; Kim, Kyoung-Seon; Oh, Tae-Hwan; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Jin-Baek, SPIE-The International Society for Optical Engineering, pp.0, SPIE, 2005-02-27

6
Dry-developable Photorersist

Kim, Jin-Baek; Kim, Hyun-Woo; Kim, Jae-Young; Choi, Jae-Hak, 한국고분자학회 1997년도 추계 학술대회, pp.153 - 154, 한국고분자학회, 1997-10-11

7
Non-Shrinkable Photoresist for Arf Lithography

Kim, Jin-Baek; Oh, Tae-Hwan; Choi, Jae-Hak; Lee, Jae Jun, 한국고분자학회 2003년도 춘계학술대회, pp.0 - 0, 한국고분자학회, 2003-04

8
Non-Shrinkable Photoresist for Arf Lithography

Kim, Jin-Baek; Oh, Tae-Hwan; Choi, Jae-Hak; Lee, Jae Jun, Advances in Resist Technology and Processing XIXI, pp.689 - 697, 2003-02-24

9
Novel molecular resists based on inclusion complex of cyclodextrin

Kim, Jin-Baek; Kwon, Young-Gil; Yun, Hyo-Jin; Choi, Jae-Hak, Advances in Resist Technology and Processing XIX, pp.837 - 845, SPIE, 2002-03-04

10
PED-Stabilized Chemically Amplified Resists Containing Basic Units in the Matrix Polymers

Kim, Jin-Baek; Choi, Jae-Hak; Kwon, Young-Gil, 한국고분자학회 1998년도 춘계 학술대회, v.23, no.1, pp.114 - 115, 한국고분자학회, 1998-04-10

11
Photosensitive Polymer Brushes Graft-Polymerized on PTFE Film for Patterned Protein Immobilization

Yoon, Je Moon; Choi, Jae-Hak; Kim, Jin-Baek, 한국고분자학회 2009년도 춘계 학술대회 , 한국고분자학회, 2009-04-09

12
Water-developable resists based on glyceryl methacrylate for 193-nm lithography

Kim, Jin-Baek; Jang, Ji-Hyun; Choi, Jae-Hak; Lee, Kwan-Ku; Ko, Jong-Sung, Advances in Resist Technology and Processing XXI, v.5376, pp.616 - 624, 2004-02-23

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