Showing results 8 to 9 of 9
Poly(3-allyl-7,7-dimethyl-oxepan-2-one-co-maleic anhydride) for a 193-nm photoresist Lee, Jae Jun; Lee, Kwan Gu; Kim, Jin-Baek, 한국고분자학회 2001년 춘계학술대회, pp.155 - 155, 한국고분자학회, 2001-04 |
Synthesis and Evaluation of a Novel Alicyclic Polymer Having 7,7-Dimethyloxepan-2-one Acid Labile Group for 193-nm Photoresists Lee, Jae Jun; Kim, Jin-Baek, 한국고분자학회 2001년도 추계학술대회, pp.35 - 35, 한국고분자학회, 2001-10 |
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