Browse "CH-Conference Papers(학술회의논문)" by Author Lee, Jae Jun
Showing results 5 to 9 of 9
| Non-Shrinkable Photoresist for Arf Lithography Kim, Jin-Baek; Oh, Tae-Hwan; Choi, Jae-Hak; Lee, Jae Jun, 한국고분자학회 2003년도 춘계학술대회, pp.0 - 0, 한국고분자학회, 2003-04 |
| Non-Shrinkable Photoresist for Arf Lithography Kim, Jin-Baek; Oh, Tae-Hwan; Choi, Jae-Hak; Lee, Jae Jun, Advances in Resist Technology and Processing XIXI, pp.689 - 697, 2003-02-24 |
| Novel alicyclic polymers having 7,7-dimethyloxepan-2-one acid labile groups for ArF lithography Lee, Jae Jun; Kim, Jin-Baek; Honda, Kenji, Advances in Resist Technology and Processing XIX, pp.110 - 119, SPIE, 2002-03-04 |
| Poly(3-allyl-7,7-dimethyl-oxepan-2-one-co-maleic anhydride) for a 193-nm photoresist Lee, Jae Jun; Lee, Kwan Gu; Kim, Jin-Baek, 한국고분자학회 2001년 춘계학술대회, pp.155 - 155, 한국고분자학회, 2001-04 |
| Synthesis and Evaluation of a Novel Alicyclic Polymer Having 7,7-Dimethyloxepan-2-one Acid Labile Group for 193-nm Photoresists Lee, Jae Jun; Kim, Jin-Baek, 한국고분자학회 2001년도 추계학술대회, pp.35 - 35, 한국고분자학회, 2001-10 |
Discover
Type
- 2 Article
- 2,286 Conference
Date issued
- 326 2020 - 2023
- 970 2010 - 2019
- 396 2000 - 2009
- 489 1990 - 1999
- 106 1980 - 1989