Browse "CH-Conference Papers(학술회의논문)" by Author Ganesan, Ramakrishnan
Showing results 4 to 8 of 8
| Negative nanomolecular resists based on calix[4]resocinarene Oh, Tae-Hwan; Ganesan, Ramakrishnan; Yoon, Je-Moon; Kim, Jin-Baek, Advances in Resist Technology and Processing XXIII, SPIE, 2006-02-20 |
| Negative Tone Resist Material Based on Polyhedral Oligomeric Silsesquioxane for 193 nm Lithography Kim, Jin-Baek; Ganesan, Ramakrishnan, 한국고분자학회 2003년도 추계학술대회, pp.0 - 0, 한국고분자학회, 2003-10 |
| Nonchemically amplified resists for deep UV lithography Ganesan, Ramakrishnan; Kim, Sumin; Youn, Seul Ki; Cho, Yungook; Yun, Jei Moon; Kim, Jin-Baek, Advances in Resist Materials and Processing Technology XXIV, SPIE, 2007-02-26 |
| Protein patterning on the polyethylene suface by radiation grafting Kim, Dong Ki; Choi, Jae Hak; Jung, Chan Hee; Kwon, Ho Je; Hwang, In Tae; No, Young Chang; Ganesan, Ramakrishnan; et al, 한국고분자학회 2008년 춘계 학술대회 , pp.0 - 0, 한국고분자학회, 2008-04-10 |
| Top surface imaging study by selective chemisorptions of poly(dimethyl siloxane) on diazoketo-functionalized polymeric surface Ganesan, Ramakrishnan; Youn, Seul Ki; Yun, Jei Moon; Kim, Jin-Baek, 24th European Mask and Lithography Conference, EMLC 2008, 2008-01-21 |
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