1 | Platinum bottom electrodes formed by electron-beam evaporation for high-dielectric thin films Lee, Hee Chul; Kim, Ho Gi, JAPANESE JOURNAL OF APPLIED PHYSICS, v.34, no.9B, pp.5220 - 5223, 1995-01 |
2 | Electrical Breakdown of the PTCR Barium Titanate Ceramics Kim, Ho Gi, 1995-01 |
3 | Characterization of (Pb1-xLax)TiO3 thin films grown by radio - Frequency magnetron sputtering and their electrical properties S.J. Chae; S.S. Park; S.G. Yoon; W.J. Lee; Kim, Ho Gi, INTEGRATED FERROELECTRICS, v.10, no.1-4, pp.63 - 72, 1995-10 |
4 | EFFECTS OF OXYGEN PARTIAL-PRESSURE ON THE MICROSTRUCTURE AND ELECTRICAL-PROPERTIES OF INDIUM TIN OXIDE FILM PREPARED BY DC MAGNETRON SPUTTERING CHOI, CG; No, Kwangsoo; Lee, Won-Jong; Kim, Ho Gi; JUNG, SO; LEE, WJ; KIM, WS; KIM, SJ; YOON, C, THIN SOLID FILMS, v.258, no.1-2, pp.274 - 278, 1995-03 |
5 | PT(PbTiO3) buffer layer effects on the electrical properties of Pb(Zr,Ti)O-3 thin films Kim, Ho Gi, MICROELECTRONIC ENGINEERING, v.29, no.2016-01-04, pp.243 - 246, 1995 |
6 | PREPARATION AND CHARACTERIZATION OF LEAD-ZIRCONATE-TITANATE THIN-FILMS BY DC REACTIVE COSPUTTERING CHO, NH; Kim, Ho Gi, INTEGRATED FERROELECTRICS, v.6, no.1-4, pp.345 - 353, 1995-01 |
7 | STRUCTURE AND ELECTRICAL-PROPERTIES OF PB(ZR,TI)O-3 THIN-FILMS DEPOSITED BY REACTIVE SPUTTERING USING MULTI-TARGETS Cho, NH; Kim, Ho Gi, THIN SOLID FILMS, v.266, no.2, pp.140 - 144, 1995-10 |
8 | Influence of microstructure and grain boundary potential barrier layer on the electrical breakdown of positive temperature coefficient BaTiO3 ceramics Kim, Ho Gi, JAPANESE JOURNAL OF APPLIED PHYSICS, v.34, no.9A, pp.4862 - 4869, 1995-09 |
9 | XPS sputter depth profiling of the chemical states for SrTiO3/Si interface by O-2(+) ion beams Kim, K. J.; Moon, D. W.; Nam. S. H.; Lee, W. J.; Kim, Ho Gi, SURFACE INTERFACE ANALYSIS, v.23, no.13, pp.851 - 857, 1995-12 |