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Results 1-10 of 13 (Search time: 0.006 seconds).
| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Surface morphology of InGaAs on GaAs(100) by chemical beam epitaxy using unprecracked monoethylarsine, triethylgallium and trimethylindium Park, SJ; Ro, JR; Ha, JS; Kim, SB; Park, HyoHoon; Lee, EH; Yi, JY; Lee, JeongYong, SURFACE SCIENCE, v.350, no.1-3, pp.221 - 228, 1996-04 | |
| Hexagonal silicon formation by pulsed laser beam annealing Kim, JH; Lee, JeongYong, MATERIALS LETTERS, v.27, no.6, pp.275 - 279, 1996-08 | |
| Transmission electron microscopy study of SiF+/BF2+ implanted and annealed (100)Si: Amorphization and residual effects Kim, JH; Lee, JeongYong; Paik, JC; Kim, HJ, JOURNAL OF APPLIED PHYSICS, v.79, no.10, pp.7549 - 7554, 1996-05 | |
| Effects of post annealing and oxidation processes on the removal of damage generated during the shallow trench etch process Lee, YJ; Hwang, SW; Oho, KH; Lee, JeongYong; Yeom, GY, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.12B, pp.6916 - 6921, 1998-12 | |
| FORMATION OF EPI-C49 TISI2/SI(111) BY SOLID-PHASE EPITAXIAL-GROWTH CHOI, CK; YANG, SJ; RYU, JY; Lee, JeongYong; LEE, YP; PARK, HH; LEE, EW; KIM, KH, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.26, no.2, pp.148 - 152, 1993-04 | |
| Comparison of the stress between rapid thermal annealed and excimer laser annealed polycrystalline silicon thin films Lee, CW; Ko, MK; Woo, SL; Oh, HW; Gho, SJ; Lee, JeongYong, SOLID STATE COMMUNICATIONS, v.105, no.12, pp.777 - 781, 1998-03 | |
| IN-SITU SOLID-PHASE EPITAXIAL-GROWTH OF C49-TISI2 ON SI(111)-7X7 SUBSTRATE CHOI, CK; YANG, SJ; RYU, JY; Lee, JeongYong; PARK, HH; KWON, OJ; LEE, YP; KIM, KH, APPLIED PHYSICS LETTERS, v.63, no.4, pp.485 - 487, 1993-07 | |
| FORMATION OF MISFIT DISLOCATIONS DURING ZN-DIFFUSION-INDUCED INTERMIXING OF A GAINASP/INP HETEROSTRUCTURE Park, HyoHoon; NAM, ES; LEE, YT; LEE, EH; Lee, JeongYong, APPLIED PHYSICS LETTERS, v.59, no.16, pp.2025 - 2027, 1991-10 | |
| FORMATION OF ULTRATHIN NISI2 FILMS AND HETEROEPITAXIAL GROWTH OF EPI-NISI2/SI(111) CHOI, CK; BOO, SE; KOH, JD; HONG, SR; Lee, JeongYong; KIM, SK; LEE, SH; CHO, KI; KIM, KH, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.27, no.5, pp.528 - 534, 1994-10 | |
| GROWTH OF EPITAXIAL C54 TISI2 ON SI(111) SUBSTRATE BY INSITU ANNEALING IN ULTRAHIGH-VACUUM KIM, KH; LEE, JJ; SEO, DJ; CHOI, CK; HONG, SR; KOH, JD; KIM, SC; Lee, JeongYong; NICOLET, MA, JOURNAL OF APPLIED PHYSICS, v.71, no.8, pp.3812 - 3815, 1992-04 |