Browse "MS-Journal Papers(저널논문)" by Subject X-ray photoelectron spectroscopy
Showing results 1 to 11 of 11
| A comparative study on the Si precursors for the atomic layer deposition of silicon nitride thin films Lee, WJ; Lee, JH; Park, Chong-Ook; Lee, YS; Shin, SJ; Rha, SK, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.45, no.5, pp.1352 - 1355, 2004-11 |
| Effect of CxNy Molecular Species on Carbon Nitride Thin Films Deposited by Radio Frequency Magnetron Sputtering Roh, Kimin; Na, Byung-Keun; Choi, Si-Kyung; Kim, Jung-Hyung; Seong, Dae-Jin; Kim, Jung-Won, JAPANESE JOURNAL OF APPLIED PHYSICS, v.47, no.11, pp.8530 - 8533, 2008-11 |
| Effects of vinylene carbonate and 1,3-propane sultone on high-rate cycle performance and surface properties of high-nickel layered oxide cathodes Oh, Jimin; Kim, Jumi; Lee, Yong Min; Kim, Ju Young; Shin, Dong Ok; Lee, Myeong Ju; HONG, DANIEL SEUNGBUM; et al, MATERIALS RESEARCH BULLETIN, v.132, pp.111008, 2020-12 |
| Electronic structure simulation of chromium aluminum oxynitride by discrete variational-X alpha method and X-ray photoelectron spectroscopy Choi, YM; Chang, HJ; Do Lee, J; Kim, E; No, Kwangsoo, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.41, no.9, pp.5805 - 5808, 2002-09 |
| Enhanced ferromagnetic properties and high temperature dielectric anomalies in Bi0.9Ca0.05Sm0.05FeO3 prepared by hydrothermal method Bharathi, K. Kamala; Ramesh, G.; Patro, L. N.; Raju, N. Ravi Chandra; Kim, Do-Kyung, MATERIALS RESEARCH BULLETIN, v.62, pp.5 - 10, 2015-02 |
| High-resolution X-ray photoelectron spectroscopy study of InTe thin film in structural phase transition from amorphous to crystalline phase Lee, Young Mi; Park, Yongsup; Sun, Chang-Woo; Lee, JeongYong; Shin, Hyun Joon; Kim, Yong Tae; Jung, Min-Cherl, THIN SOLID FILMS, v.518, no.15, pp.4442 - 4445, 2010-05 |
| Optical properties of thin amorphous silicon film on a phase shift mask for 157 nm lithography Kim, SungKwan; Kim, YangSoo; Choi, YoungMin; Choi, JongWan; Hong, Jongin; Shon, JungMin; Sung, Tae-Hyun; et al, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, v.43, no.5A, pp.2523 - 2529, 2004-05 |
| Reactive ion etching mechanism of copper film in chlorine-based electron cyclotron resonance plasma Lee, SK; Chun , Soung Soon; Hwang, CY; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.1A, pp.50 - 55, 1997-01 |
| Reactive ion etching mechanism of RuO2 thin films in oxygen plasma with the addition of CF4, Cl-2, and N-2 Lee, EJ; Kim, JW; Lee, Won-Jong, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.5A, pp.2634 - 2641, 1998-05 |
| Water-induced degradation of chromium fluoride films Kim, EN; Hong, Daniel Seungbum; Gorman, JD; Lim, SC; Moon, SY; Kim, DW; No, Kwangsoo, THIN SOLID FILMS, v.324, no.1-2, pp.292 - 299, 1998-07 |
| Work function investigations of Al-doped ZnO for band-alignment in electronic and optoelectronic applications Drewelow, Grant; Reed, Austin; Stone, Chandon; Roh, Kwangdong; Jiang, Zhong-Tao; Linh Nguyen Thi Truc; No, Kwangsoo; et al, APPLIED SURFACE SCIENCE, v.484, pp.990 - 998, 2019-08 |
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