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P and As implantation enhanced formation of metal-free oxide on WSi2

Lee, JG; Kim, JY; Lee, JeongYong; Roh, JS; Huh, JS, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.12A, pp.7140 - 7145, 1997-12

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