Browse "MS-Journal Papers(저널논문)" by Subject HAFNIUM OXIDE

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Interfacial layer properties of HfO2 films formed by plasma-enhanced atomic layer deposition on silicon

Park, PK; Roh, JS; Choi, BH; Kang, SW, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.9, no.5, pp.F34 - F37, 2006-03

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