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Single-layer halftone phase-shifting masks for DUV microlithography: Optical property simulation and chromium compound film preparation

Jiang, ZT; Hong, Daniel Seungbum; Kim, E; Bae, Byeong-Soo; Lim, S; Woo, SG; Koh, YB; et al, APPLIED SURFACE SCIENCE, v.113, pp.680 - 684, 1997-04

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